Sputtering Targets

Krastsvetmet produces silver sputtering targets for float-glass energy efficient coating using unique production technology. Our targets are able to form a firm cover of even thickness (10-20) nm using a magnetron sputtering deposition technology.

The targets quality characteristics are:

  • high purity of silver in the targets (99.99%);
  • structural homogeneity across the target body, maximum grain size: 100-200 microns;
  • no gas pores, cavities, cracks and foliations;
  • precise processing of targets effective area;
  • small uncertainties of targets geometrical dimensions.

Krastsvetmet’s targets are appreciated by consumers for their materials quality and effective operation.